Simple and reliable relationships exist between the change in UV absorbance
(Delta A) of NOM when it is chlorinated and the formation of chlorinated b
yproducts. These relationships provide an approach for obtaining large amou
nts of data that can be used to interpret the kinetics, stoichiometry, and
mechanism of the reactions. Analysis of these relationships suggests that t
he functional groups that are the major precursors for DBPs might be highly
activated aromatic rings, as has been suggested previously, but that these
groups have some fundamental differences from highly activated rings in pu
re compounds. The key evidence for this difference is that the UV absorbanc
e of NOM decreases when dosed with even very low concentrations of chlorine
, whereas the absorbance of pure compounds such as 3,5-DHBA and resorcinol
increases. When hypochlorite species (HOCl and OCl-) are added to a solutio
n containing NOM, between 1.6 end 4.1 CI atoms become incorporated into NOM
for each activated aromatic ring that is destroyed. The rate of CI incorpo
ration into organic molecules is very rapid initially and decreases steadil
y thereafter. Chlorine reduction on the other hand (or, equivalently, NOM o
xidation) is negligible initially and then increases over time. The effect
of these parallel processes is that the amount of CI that becomes incorpora
ted into organic molecules as a fraction of the amount of HOCl and OCl- con
sumed decreases from near 100% initially to near 20% over the course of the
reaction. Considering that many of the carbon atoms in NOM probably do not
participate in redox reactions with CI, those that do must be oxidized qui
te substantially during the process, and it is likely that atoms other than
C (particularly RI) also provide some of the electrons to reduce CI. Expan
ded use of Delta A to study DBP-forming reactions is likely to lead to more
insights into key aspects of the reaction mechanisms.