Kp. Wang et al., Interfacial shear stress, peeling stress, and die cracking stress in trilayer electronic assemblies, IEEE T COMP, 23(2), 2000, pp. 309-316
Citations number
17
Categorie Soggetti
Material Science & Engineering
Journal title
IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES
Interfacial shear stress, peeling stress, and die cracking stress due to th
ermal and elastic mismatch in layered electronic assemblies are one of the
major causes of the mechanical failure of electronic packages. A simple but
rather accurate method is developed to estimate these thermal stresses for
packages with different layer lengths. For layered electronics with thin a
dhesives, analytical expressions are obtained for interfacial shear stress
and peeling stress, and they agree well with the finite element analysis, e
specially when the moduli of adhesive layers are significantly lower than t
he moduli of the other layers. An analytic expression of die cracking stres
s is also obtained for multilayer electronic assemblies.