Increased mobility anisotropy in selectively doped AlxGa1-xAs/GaAs heterostructures with high electron densities

Citation
D. Reuter et al., Increased mobility anisotropy in selectively doped AlxGa1-xAs/GaAs heterostructures with high electron densities, J APPL PHYS, 88(1), 2000, pp. 321-325
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
1
Year of publication
2000
Pages
321 - 325
Database
ISI
SICI code
0021-8979(20000701)88:1<321:IMAISD>2.0.ZU;2-9
Abstract
We have investigated the electron transport properties of a two-dimensional electron gas in a selectively doped AlxGa1-xAs/GaAs heterostructure with r educed Al content in the doped layer by recording the longitudinal resistan ce as a function of magnetic field and performing Hall measurements at low magnetic fields on the same sample. The electron density was varied by step wise illumination and we observe a dip in the mobility versus density depen dence around a density of 5.0x10(11) cm(-2). As a reason for this mobility decrease we identify by magnetotransport measurements the onset of parallel conductance in the Si-doped AlxGa1-xAl layer. With the onset of parallel c onductance, the anisotropy in the electron mobility increases significantly . We attribute this to an increase of interface roughness scattering induce d by the parallel conducting channel. (C) 2000 American Institute of Physic s. [S0021-8979(00)03213-8].