Computer simulation is used to study the effect of deep electron traps (irr
eversible one-electron traps) on contrast in AgCl. Theoretical response cur
ves derived by Silberstein are used to demonstrate the highest contrast pos
sible for a given threshold for developablilty. These curves are then used
as benchmarks in the simulation study. Agreement with the theoretical curve
s is approached as recombination decreases, assuming the concentration of d
eep electron traps and their trapping radii allow their electron trapping t
o dominate latent-image formation. Sensitometric data on emulsions with RuC
l5(NO)(2-) as a deep electron trap show that spectral sensitizing dyes that
are expected to be good hole traps reduce or eliminate the high contrast i
nduced by the dopant. This effect is consistent with the predictions obtain
ed from computer simulation.