Effect of deep electron traps on contrast in AgCl emulsions

Citation
Rk. Hailstone et al., Effect of deep electron traps on contrast in AgCl emulsions, J IMAG SC T, 44(3), 2000, pp. 250-256
Citations number
29
Categorie Soggetti
Optics & Acoustics
Journal title
JOURNAL OF IMAGING SCIENCE AND TECHNOLOGY
ISSN journal
10623701 → ACNP
Volume
44
Issue
3
Year of publication
2000
Pages
250 - 256
Database
ISI
SICI code
1062-3701(200005/06)44:3<250:EODETO>2.0.ZU;2-9
Abstract
Computer simulation is used to study the effect of deep electron traps (irr eversible one-electron traps) on contrast in AgCl. Theoretical response cur ves derived by Silberstein are used to demonstrate the highest contrast pos sible for a given threshold for developablilty. These curves are then used as benchmarks in the simulation study. Agreement with the theoretical curve s is approached as recombination decreases, assuming the concentration of d eep electron traps and their trapping radii allow their electron trapping t o dominate latent-image formation. Sensitometric data on emulsions with RuC l5(NO)(2-) as a deep electron trap show that spectral sensitizing dyes that are expected to be good hole traps reduce or eliminate the high contrast i nduced by the dopant. This effect is consistent with the predictions obtain ed from computer simulation.