Oxidation kinetics of low-oxygen silicon carbide fiber

Citation
T. Shimoo et al., Oxidation kinetics of low-oxygen silicon carbide fiber, J MATER SCI, 35(13), 2000, pp. 3301-3306
Citations number
31
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE
ISSN journal
00222461 → ACNP
Volume
35
Issue
13
Year of publication
2000
Pages
3301 - 3306
Database
ISI
SICI code
0022-2461(200007)35:13<3301:OKOLSC>2.0.ZU;2-R
Abstract
The effect of partial pressure and temperature on the oxidation rate of low -oxygen silicon carbide fiber (Hi-Nicalon) has been investigated. The initi al oxidation rate was described by a two-dimensional disc contracting formu la for reaction control, and the activation energy was 155 kJ/mol. The rate at the later stage of oxidation obeyed the equation for diffusion control, and the activation energy was 109 kJ/mol. Both the rate constants were pro portional to oxygen partial pressure. The diffusion species through the SiO 2 film are considered to be oxygen molecules. (C) 2000 Kluwer Academic Publ ishers.