Focused ion beam induced deposition: fabrication of three-dimensional microstructures and Young's modulus of the deposited material

In this work, some of the possibilities of focused ion beams for applicatio ns in microsystem technology are explored. Unlike most previous studies, th e emphasis is on 'additive' techniques, i.e. localized maskless deposition of metals and insulators. More precisely, we will show the possibility of f abricating small three-dimensional structures, using focused ion beam depos ition of silicon oxide. Deposition examples will show that the technique is most promising for small post-processing steps or prototyping, because of its high degree of flexibility. Furthermore, an investigation into the mech anical properties of the deposited material is presented. More specifically , the Young's modulus of the deposited silicon oxide is determined.