The industrial use of silicon on insulator (SOI) substrates is quickly spre
ading. For microelectronics applications, this material brings new function
ality, such as radiation-hard. high-voltage or low-voltage and low-consumpt
ion integrated circuits. Industrial wafers are now commercially available a
nd new technologies, such as Smart Cut(R) from SOITEC company, will provide
low prices in high-volume production. SOI also provides very important fea
tures for microelectromechanical systems (MEMS) and new industrial products
, such as high-temperature and low-noise piezoresistive pressure sensors or
miniature high-performance capacitive pressure and acceleration sensors, a
re now proposed. These new generic technologies will provide various indust
rial products in the near future.