Atomic oxygen recombination on fused silica: modelling and comparison to low-temperature experiments (300 K)

This work is devoted to the study of atomic oxygen recombination on a glass surface, mainly in connection with atomic sources development. Ln this pap er we present a non-stationary model for atomic oxygen recombination on a f used silica surface. Kinetics equations for oxygen atoms, taking into accou nt heterogeneous reactions between gaseous atoms and the surface (Eley-Ride al mechanisms), as well as homogeneous processes involving surface migratio n of adsorbed species (Langmuir-Hinshelwood mechanisms), are solved. Surfac e reaction coefficients an calculated, and the choice of numerical values f or surface parameters is discussed. The solution to the equations is compar ed to our previous experiments concerning the influence of the surface stat e on atomic recombination. An estimation is made of surface reaction coeffi cient values.