Time-resolved laser-induced fluorescence study of NO removal plasma technology in N-2/NO mixtures

Citation
F. Fresnet et al., Time-resolved laser-induced fluorescence study of NO removal plasma technology in N-2/NO mixtures, J PHYS D, 33(11), 2000, pp. 1315-1322
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN journal
00223727 → ACNP
Volume
33
Issue
11
Year of publication
2000
Pages
1315 - 1322
Database
ISI
SICI code
0022-3727(20000607)33:11<1315:TLFSON>2.0.ZU;2-4
Abstract
The laser-induced fluorescence technique is used to study NO removal in N-2 /NO mixtures, after excitation by a homogeneous photo-triggered discharge. Time-resolved experiments are performed in the decaying post-discharge in o rder to measure the NO concentration 200 mu s after a 75 ns duration curren t pulse. For the first time the NO removal is measured for a single current pulse excitation of the polluted mixture near atmospheric pressure. We dis cuss the influence of both the electrical energy deposited in the discharge and the initially applied reduced electric field on the NO removal efficie ncy. It is shown that near 100% of the initial NO molecules can be removed with a single shot, depending on experimental conditions. A detailed kineti c analysis is performed, which leads to straightforward analytical approach used to estimate the N atom density produced by the discharge as a functio n of the electrical parameters values. It strengthens that, with regard to known kinetic processes, the ideal case for 100% NO removal is to create th e exact number of N atoms corresponding to the number of NO molecules, at t he lowest energetic cost.