Effects of hydrogen on doping of GaInNAs grown by gas-source molecular beam epitaxy

Citation
Hp. Xin et al., Effects of hydrogen on doping of GaInNAs grown by gas-source molecular beam epitaxy, J VAC SCI B, 18(3), 2000, pp. 1476-1479
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
3
Year of publication
2000
Pages
1476 - 1479
Database
ISI
SICI code
1071-1023(200005/06)18:3<1476:EOHODO>2.0.ZU;2-N
Abstract
In this article, we investigate the effects of hydrogen (H) on doping of Ga InNAs grown by gas-source molecular beam epitaxy with a rf plasma nitrogen radical beam source. Incorporating nitrogen (N) into p-Ga0.892In0.018As red uces strain and improves thermal stability. With increasing N concentration , more H, from thermally cracked AsH3, is incorporated alongside N into GaI nAs. H has two effects on GaInNAs: acting as an isolated donor and passivat ing shallow dopants by forming complexes. With increasing N concentration, the free carrier concentration in the as-grown highly Be-doped Ga0.892In0.1 08NxAs1-x is decreased mainly due to H passivation. Rapid thermal annealing (RTA) increases free carrier concentration due to a reduced I-I level. The as-grown undoped Ga0.924In0.076N0.030As0.970,, sample should be p type wit hout I-I since N introduces a localized acceptor-like level. Our as-grown u ndoped sample in n-type 6.9 x 10(15) cm(-3) due to charge compensation with H donors. After 700 degrees C RTA, the film becomes p-type 5.7 X 10(16) cm (-3) due to the reduced H donors. For highly Si-doped GaInNAs (similar to 1 x 10(18) cm(-3)), H mainly passivates the dopants, so the free carrier con centration is increased after RTA. (C) 2000 American Vacuum Society. [S0734 -211X(00)02603-2].