Optimization of buffer layers for InGaAs/AlGaAs PIN optical modulators grown on GaAs substrates by molecular beam epitaxy

Citation
Ds. Katzer et al., Optimization of buffer layers for InGaAs/AlGaAs PIN optical modulators grown on GaAs substrates by molecular beam epitaxy, J VAC SCI B, 18(3), 2000, pp. 1609-1613
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
3
Year of publication
2000
Pages
1609 - 1613
Database
ISI
SICI code
1071-1023(200005/06)18:3<1609:OOBLFI>2.0.ZU;2-N
Abstract
In this work we compare the effect of the buffer layer on the device qualit y and surface morphology of strained InGaAs/AlGaAs PIN multiple quantum wel l (WQW) modulators, We examine GaAs buffer layers and linearly graded InGaA s buffer layers. Our results indicate that for lower indium concentrations in the quantum wells (less than about 23%) better device performance and su rface morphology are obtained by growing directly on GaAs. PIN MQWs with in dium mole fractions higher than about 24% have better. properties when a li neal-ly graded buffer layer is used.