Microstructural evolution of duplex grain structure and interpretation of the mechanism for NiO scales grown on pure Ni- and Cr-doped substrates during high temperature oxidation

Authors
Citation
H. Kyung et Ck. Kim, Microstructural evolution of duplex grain structure and interpretation of the mechanism for NiO scales grown on pure Ni- and Cr-doped substrates during high temperature oxidation, MAT SCI E B, 76(3), 2000, pp. 173-183
Citations number
48
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
76
Issue
3
Year of publication
2000
Pages
173 - 183
Database
ISI
SICI code
0921-5107(20000714)76:3<173:MEODGS>2.0.ZU;2-P
Abstract
Duplex layers are a very important class of film microstructures and form u nder a wide variety of processing conditions such as oxidation (sulfidation ), sputtering, evaporation and casting on a large number of substrates. In this paper, the available models for duplex layer formation are criticized in detail and the basic assumptions which are based upon them are examined. Then, mechanisms of formation of the duplex layers based on microstructura l observations in pure Ni and Ni-lat% Cr systems during high temperature ox idation are addressed. (C) 2000 Elsevier Science S.A. All rights reserved.