Oxidation, diffusion and segregation in CuNi(Mn) films studied by AES

The surface and in-depth compositions of sputter-deposited Cu0.57Ni0.42Mn0. 01 thin films were studied by Auger electron depth profiling after thermal treatment. The samples were thermally cycled to maximum temperatures of 300 degrees C in air, argon and forming gas (N-2, 5 vol. % H-2). Linear least- squares fit to standard spectra and factor analysis were applied to separat e the overlapping Auger transitions of Cu and Ni. Under bombardment by 4 keV argon ions, CuNi(Mn) layers display bombardment- induced surface enrichment of Ni in the same extent as binary CuNi alloys. At sufficiently high oxygen partial pressures, a duplex oxide layer is form ed and a thick surface copper oxide overgrows the initial nickel oxide. In reducing atmosphere selective oxidation of manganese takes place. A capping NiCr layer prevents CuNi(Mn) from being oxidized, but the film co nfiguration is degraded with increasing annealing temperature due to format ion of a surface chromium oxide and diffusion of Ni from the CuNi(Mn) layer into the NiCr/CuNi(Mn) interface.