New BaTiO3-SrTiO3 (BTO-STO)-superlattices which may be interesting for futu
re electronic applications have been investigated by X-ray photoelectron sp
ectroscopy (XPS) depth profiling. At first XPS measuring conditions were op
timized for that non-conducting and thin layer systems (21 nm double layer
thickness) considering the practical instrumental limitations. Second a sim
ulation of the sputtering process for the concrete experimental conditions
were done by a dynamic T-DYN code. By comparison of experimental and simula
ted depth profiles the maximum sample roughness could be estimated to be in
the range of 2 nm.