Defects and diffusion in silicon technology

Authors
Haynes, TE
Citation
Te. Haynes, Defects and diffusion in silicon technology, MRS BULL, 25(6), 2000, pp. 14-15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MRS BULLETIN
ISSN journal
08837694 → ACNP
Volume
25
Issue
6
Year of publication
2000
Pages
14 - 15
Database
ISI
SICI code
0883-7694(200006)25:6<14:DADIST>2.0.ZU;2-#