Water adsorption on UHV cleaved InP(110) surfaces

Authors
Henrion, O Klein, A Jaegermann, W
Citation
O. Henrion et al., Water adsorption on UHV cleaved InP(110) surfaces, SURF SCI, 457(1-2), 2000, pp. L337-L341
Citations number
32
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
457
Issue
1-2
Year of publication
2000
Pages
L337 - L341
Database
ISI
SICI code
0039-6028(20000601)457:1-2<L337:WAOUCI>2.0.ZU;2-D
Abstract
H2O was adsorbed onto n-InP(110) cleavage planes at 100 K and its interacti on with the surface was investigated by SXPS and LEED. H2O is dissociativel y adsorbed at low coverages forming In-OH and P-H bonds, which lead to pinn ing acceptor states close to midgap. At higher coverages H2O is molecularly adsorbed and flat band potential is retained. During annealing first the m olecularly adsorbed H2O desorbs and afterwards the surface rearranges to fo rm an In suboxide. The oxidized surface shows Fermi level pinning at E-F-E- VB = 0.9 eV. (C) 2000 Elsevier Science B.V. All rights reserved.