Reproducible switching effect in thin oxide films for memory applications

Citation
A. Beck et al., Reproducible switching effect in thin oxide films for memory applications, APPL PHYS L, 77(1), 2000, pp. 139-141
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
1
Year of publication
2000
Pages
139 - 141
Database
ISI
SICI code
0003-6951(20000703)77:1<139:RSEITO>2.0.ZU;2-N
Abstract
Thin oxide films with perovskite or related structures and with transition metal doping show a reproducible switching in the leakage current with a me mory effect. Positive or negative voltage pulses can switch the resistance of the oxide films between a low- and a high-impedance state in times short er than 100 ns. The ratio between these two states is typically about 20 bu t can exceed six orders of magnitude. Once a low-impedance state has been a chieved it persists without a power connection for months, demonstrating th e feasibility of nonvolatile memory elements. Even multiple levels can be a ddressed to store two bits in such a simple capacitor-like structure. (C) 2 000 American Institute of Physics. [S0003-6951(00)04327-8].