Amorphous carbon and carbon nitride films synthesized by electrolysis of nitrogen-containing liquid

Citation
H. Wang et al., Amorphous carbon and carbon nitride films synthesized by electrolysis of nitrogen-containing liquid, DIAM RELAT, 9(7), 2000, pp. 1307-1311
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
9
Issue
7
Year of publication
2000
Pages
1307 - 1311
Database
ISI
SICI code
0925-9635(200007)9:7<1307:ACACNF>2.0.ZU;2-M
Abstract
Nitrogen-containing liquids N,N-dimethylformamide [HCON(CH3)(2)] and acrylo nitrile (CH2CHCN) were selected as electrolytes in attempt to electrochemic ally deposit carbon nitride films on silicon substrates at atmospheric pres sure and low temperature. The composition and bonding states in these films have been characterized by using X-ray photoelectron spectroscopy (XPS), R aman, and Fourier transform infrared (FTIR) measurements. It was evidenced that hydrogenated amorphous carbon nitride (alpha-CNx:H) films could be syn thesized in acrylonitrile liquid, however, in N,N-dimethylformamide, only a lpha-C:H:O films were obtained. These results indicate that electrodepositi on of CNx films in the liquid phase is possible, and the selection of elect rolytes and optimization of experimental parameters are the key factors in the liquid deposition process. (C) 2000 Elsevier Science S.A. All rights re served.