DEPOSITION OF AMORPHOUS M1-NI FILMS USING ION-BEAM SPUTTERING AND THEIR ELECTROCATALYTIC PROPERTIES

Citation
Wk. Hu et al., DEPOSITION OF AMORPHOUS M1-NI FILMS USING ION-BEAM SPUTTERING AND THEIR ELECTROCATALYTIC PROPERTIES, Surface & coatings technology, 91(3), 1997, pp. 225-229
Citations number
27
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
91
Issue
3
Year of publication
1997
Pages
225 - 229
Database
ISI
SICI code
0257-8972(1997)91:3<225:DOAMFU>2.0.ZU;2-G
Abstract
Amorphous MlNi(2.52) and MlNi(2.44) films were prepared by ion-beam sp uttering on iron substrates. The corresponding crystalline samples wer e obtained by annealing the amorphous samples. The electrocatalytic pr operties of the MI-Ni film cathodes for the hydrogen evolution reactio n were investigated in 30 wt.% ROH at 70 degrees C. It was found that amorphous samples had better activity than crystalline samples. In add ition, the amorphous films had excellent resistance to hydrogen embrit tlement, good adhesion to substrates, and good stability after long-te rm electrolysis in alkaline solution at 200 mA cm(-2) and 70 degrees C .