Characterization of ZrO2/Y2O3 laser ablation plasma in vacuum, oxygen, andargon environments

Citation
Aa. Voevodin et al., Characterization of ZrO2/Y2O3 laser ablation plasma in vacuum, oxygen, andargon environments, J APPL PHYS, 88(2), 2000, pp. 1088-1096
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
2
Year of publication
2000
Pages
1088 - 1096
Database
ISI
SICI code
0021-8979(20000715)88:2<1088:COZLAP>2.0.ZU;2-X
Abstract
Laser ablation deposition of highly oriented yttria stabilized zirconia (YS Z) films is important for various technological applications and depends cr itically on the selection of background environment, with low pressure oxyg en being the most common choice. Here, the spatial-temporal distribution of YSZ plume chemistry, excitation states, and energy was determined for abla tions in vacuum, low pressure O-2, and low pressure Ar, using fluorescence analyses, element specific imaging techniques, and time-of-flight experimen ts. It was found that an Ar background considerably promotes excitation and ionization of zirconium during the first 1-3 mu s after the laser strike. There is much less zirconium excitation in an O-2 background, where a large fraction of atomic oxygen with a broad spatial distribution was found. ZrO and YO molecules were observed in both environments. Their highest concent rations were in the O-2 background, where fluorescence from these molecules near the substrate lasted for 2-5 mu s. Neutral species in YSZ plumes were fitted to Maxwellian type velocity distributions with a shifted center of mass. Kinetic energies derived from the fitted data were reduced by about a factor of 2 in Ar and O-2 backgrounds compared to in vacuum. This was not observed for Zr1+ species, which maintained about 100-120 eV mean kinetic e nergy nearly independently of the background. The ionization of Zr in the p resence of Ar, the high velocity of ionized Zr atoms relative to the rest o f the plume, the generation of molecular ZrO, YO, and atomic oxygen in the presence of O-2 are potentially important for chemistry and structure contr ol of YSZ films. (C) 2000 American Institute of Physics. [S0021-8979(00)010 14-8].