The impact of increasing the amount of electrodeposited ruthenium and of po
tential/time treatment of ruthenium substrates on the electrochemical prope
rties of anodically formed ruthenium oxide films, are investigated by use o
f cyclic voltammetry, electrochemical quartz crystal microbalance, anodic a
nd cathodic current transients, and electrochemical impedance spectroscopy.
In addition to the specific interpretation of results obtained by each of
the techniques used, general discussion in terms of the essential charge st
orage characteristics of ruthenium oxide films is presented. It is shown th
at an increase in the ruthenium loading acts beneficially on the stability
of oxide films over a range of potentials, but detrimentally on the kinetic
s of the overall charging/discharging reaction, which becomes proton mass t
ransfer limited. On the other hand, potential/time treatment of ruthenium s
ubstrates acts detrimentally on the stability of related oxide films, but m
akes the kinetics of the oxide film charging/discharging reaction more reve
rsible. Total capacitance values of oxide films presented per gram of elect
rodeposited ruthenium are found to be almost independent of ruthenium loadi
ng, and slightly increased by the potential/time treatment performed. This
all points to the fact that an increase in the ruthenium loading and potent
ial/time treatment of ruthenium substrates results primarily in beneficial
changes in the morphology of related oxide films. The magnitudes of the tot
al capacitances per gram of electroplated ruthenium, however, remain strong
ly determined by the method of preparation of ruthenium substrates, and can
not be significantly changed by either an increase in the ruthenium loading
or by the potential/time treatment of the ruthenium substrates. (C) 2000 E
lsevier Science S.A. All rights reserved.