Micromachining process simulation using a continuous cellular automata method

In this paper, we present results on the development of an anisotropic crys talline etching simulation (ACES) program based on a continuous cellular au tomata (CA) model. The program provides improved spatial resolution and acc uracy compared with the conventional and stochastic CA methods. Implementat ion of a three-dimensional (3-D) dynamic CA technique provides increased si mulation speed and reduced memory requirement. The first AGES software base d on common personal computer platforms has been realized for simulation of micromachining processes and visualizing results in 3-D space. The softwar e is uniquelv capable of simulating the resultant profile following a serie s of micromachining steps, including surface passivation, reactive ion etch ing, as well as wet chemical bulk etching. A novel method for accurately ob taining the etch-rate diagram of anisotropic etching using both experimenta l and numerical techniques has been developed.