Mechanism of reductive desorption of self-assembled monolayers on the basis of Avrami theorem and diffusion

A mathematical model for the reductive desorption of self-assembled monolay ers has been developed. The model is based on the previously presented mode l in which desorption occurs as growing empty patches, The overlap of patch es is described by using the Avrami theorem, and the diffusion rate or the desorbing compound is tal;en into account. The resulting mathematical expre ssion is a nonlinear integral equation with two adjustable parameters. The model is fitted to the experimental results on the desorption of nonanethio l from a self-assembled layer on Au(111). Reasonably good fits are obtained at four desorption potentials.