Electronic structures of GaN edge dislocations

Citation
Sm. Lee et al., Electronic structures of GaN edge dislocations, PHYS REV B, 61(23), 2000, pp. 16033-16039
Citations number
39
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
61
Issue
23
Year of publication
2000
Pages
16033 - 16039
Database
ISI
SICI code
0163-1829(20000615)61:23<16033:ESOGED>2.0.ZU;2-U
Abstract
We investigate atomic and electronic structures of the threading edge dislo cations of GaN using self-consistent-charge density-functional tight-bindin g approaches. Full-core, open-core, Ca-vacancy, and N-vacancy edge dislocat ions are fully relaxed in our total-energy scheme. The Ca-vacancy dislocati on is the most stable in a wide range of Ga chemical potentials, whereas fu ll-core and open-core dislocations are more stable than others in the Ga-ri ch region. Partial dehybridization takes place during the lattice relaxatio n near the dislocation in all cases. The dangling bonds at Ga atoms mostly contribute to the deep-gap states, whereas those at N atoms contribute to t he valence-band tails. All the edge dislocations can act as deep trap cente rs, except the Ga-vacancy dislocation, which may act as an origin of yellow luminescence.