We report fabrication and measurements with two- and four-point probes with
nanoscale dimensions, for high spatial resolution conductivity measurement
s on surfaces and thin films. By combination of conventional microfabricati
on and additive three-dimensional nanolithography, we have obtained electro
de spacings down to 200 nm. At the tips of four silicon oxide microcantilev
ers, narrow carbon tips are grown in converging directions and subsequently
coated with a conducting layer. The probe is placed in contact with a cond
ucting surface, whereby the electrode resistance can be determined. The nan
oelectrodes withstand considerable contact force before breaking. The probe
offers a unique possibility to position the voltage sensors, as well as th
e source and drain electrodes in areas of nanoscale dimensions. (C) 2000 Am
erican Institute of Physics. [S0034-6748(00)02607-1].