Comparison of CxNy : H films obtained by deposition using magnetron sputtering or an inductively coupled plasma

Several CxNy:H specimens (A(1)-A(6)) were deposited using a magnetron sputt ering system driven at 13.56 MHz in nitrogen with an unbiased substrate usi ng a pure graphite target as the carbon source. For deposition in the induc tively coupled plasma (ICP) rig concerned, driven at the same frequency, tw o source mixtures were used, i.e. either methane (CH4) or adamantane (C10H1 6) in nitrogen. Examination of the XPS C 1s envelope from the magnetron-dep osited films shows different band shapes and two main peak positions depend ing on the bonding within the films. The band shapes and the energy positio ns of the peaks present are a function of the film composition (expressed a s at.%), itself influenced by the deposition regime. The corresponding spec imens deposited with the ICP rig from a CH4/N-2 plasma exhibit C 1s envelop es showing clearly a significant difference in their shape (correlated with chemical shift) compared to those magnetron sputter-deposited using the pu re graphite target. In the magnetron-deposited films one distinct C 1s band is observed, and its position and the contributing component Lines therein change as a function of the relative abundance of C,O and N found in the f ilms examined. The films deposited using C10H16/N-2 mixtures give features for the C 1s envelope of the CxNy:H material obtained that, when compared t o the data of the two sets of films alluded to above, are again different f rom those of the magnetron-deposited material, However, they do show simila rities to the behaviour of the analogous CH4/N-2 films. Comparison of speci mens from these three deposition regimes indicates clearly a number of sign ificant compositional and structural differences, depending on the route us ed. The details of the analogous N 1s component of the same specimens were also investigated. Finally, static SIMS of a diamond-like carbon specimen a nd CxNy:H films was performed, showing similarities for low m/z and differe nces for higher m/z, particularly with respect to the oxygen bound in the C xNy:H matrix. Copyright (C) 2000 John Wiley & Sons, Ltd.