A kinetic scanning tunneling microscopy study of iron silicide growth on Si(113)

High-temperature kinetic scanning tunneling microscopy (STM) studies are us ed to investigate the surface morphology and growth mode of iron silicide o n Si(113) formed by gas-source reactive iron deposition with Fe(CO)(5) as p recursor. The first monolayer of silicide on Si(113) forms a (4 x n) recons truction that covers the surface completely before growth proceeds via the formation of strongly anisotropic, three-dimensional silicide islands. Afte r the first monolayer is closed, growth is slowed down by a blocked interdi ffusion with the silicon substrate and a reduced sticking probability for t he precursor. Lateral spreading of the islands is achieved by a stoichiomet ric codeposition of iron and silicon using Fe(CO)(5) and Si2H6. In this way , nearly closed layers of silicide can be grown. (C) 2000 Elsevier Science B.V. All rights reserved.