The influence of a surface adsorbed layer on the of ratio of Si L23VV to Si
KL23L23 intensities was taken into account in order to apply the method of
silicon particle size evaluation to a realistic porous silicon surface wit
h adsorbed impurities.
It is shown that etching of the electrochemically prepared porous silicon i
n HF solution leads to more monotonic growth of the silicon particle size u
nder movement from the porous silicon surface to an interface with a single
crystal silicon. It is shown that Ti and Ni impurities on a porous silicon
surface lead to a decrease in oxygen and carbon content in the porous sili
con layer and an increase in the evaluated size of silicon particles in the
porous silicon layer. (C) 2000 Elsevier Science B.V. All rights reserved.