The carbon deposition mechanism in vapor phase lubrication

Citation
Dx. Ren et Aj. Gellman, The carbon deposition mechanism in vapor phase lubrication, TRIBOL T, 43(3), 2000, pp. 480-488
Citations number
36
Categorie Soggetti
Mechanical Engineering
Journal title
TRIBOLOGY TRANSACTIONS
ISSN journal
10402004 → ACNP
Volume
43
Issue
3
Year of publication
2000
Pages
480 - 488
Database
ISI
SICI code
1040-2004(200007)43:3<480:TCDMIV>2.0.ZU;2-M
Abstract
The study of various alkoxy species on metal surfaces has provided insight into the mechanism by which carbon is deposited into the lubricating films of polyphosphate glass generated by arylphosphate vapor phase lubricants. P revious work using trimethylphosphite has suggested that one of the initial steps in the decomposition of organophosphorus compounds on metal surfaces is cleavage of P-O bonds to produce adsorbed alkoxy species. In the case o f alkyl alkoxy groups (poor ligands for vapor phase lubrication) there are reaction mechanisms such as beta-hydride elimination which efficiently remo ve hydrocarbons from the surface. In the case of the aryl alkoxy groups (go od ligands for vapor phase lubricants) such mechanisms cannot be active due to the lack of beta-hydrogen atoms. Experiments using various alkoxy speci es demonstrate these differences and reveal that phenoxy groups deposit car bon onto the surface quite efficiently while cyclohexanoxy and t-butanoxy g roups do not.