Polarization effects, surface states, and the source of electrons in AlGaN/GaN heterostructure field effect transistors

Citation
Jp. Ibbetson et al., Polarization effects, surface states, and the source of electrons in AlGaN/GaN heterostructure field effect transistors, APPL PHYS L, 77(2), 2000, pp. 250-252
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
2
Year of publication
2000
Pages
250 - 252
Database
ISI
SICI code
0003-6951(20000710)77:2<250:PESSAT>2.0.ZU;2-#
Abstract
The origin of the two-dimensional electron gas (2DEG) in AlGaN/GaN heterost ructure field effect transistors is examined theoretically and experimental ly. Based on an analysis of the electrostatics, surface states are identifi ed as an important source of electrons. The role of the polarization-induce d dipole is also clarified. Experimental Hall data for nominally undoped Al 0.34Ga0.66N/GaN structures indicate that similar to 1.65 eV surface donors are the actual source of the electrons in the 2DEG, which forms only when t he barrier thickness exceeds 35 Angstrom. (C) 2000 American Institute of Ph ysics. [S0003-6951(00)01128-1].