Interplay between segregation, roughness, and local strains in the growth of Ga0.75In0.25P alloy

Citation
X. Wallart et al., Interplay between segregation, roughness, and local strains in the growth of Ga0.75In0.25P alloy, APPL PHYS L, 77(2), 2000, pp. 253-255
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
2
Year of publication
2000
Pages
253 - 255
Database
ISI
SICI code
0003-6951(20000710)77:2<253:IBSRAL>2.0.ZU;2-2
Abstract
In this work, using reflexion high energy electron diffraction and atomic f orce microscopy, we compare the growth of strained Ga0.75In0.25P alloys on GaAs(001) and GaP (001) substrates. We show that although the absolute stra in value is similar in both cases, the transition from a bidimensional to a three-dimensional growth mode occurs much faster in the tensile case than in the compressive one. We interpret this result with a microscopic theoret ical model which takes into account the interplay between a weak surface ro ughness, In vertical and lateral segregation, and strain effects. (C) 2000 American Institute of Physics. [S0003-6951(00)00828-7].