Fabrication of high-magnetoresistance tunnel junctions using Co75Fe25 ferromagnetic electrodes

Citation
Xf. Han et al., Fabrication of high-magnetoresistance tunnel junctions using Co75Fe25 ferromagnetic electrodes, APPL PHYS L, 77(2), 2000, pp. 283-285
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
2
Year of publication
2000
Pages
283 - 285
Database
ISI
SICI code
0003-6951(20000710)77:2<283:FOHTJU>2.0.ZU;2-0
Abstract
Temperature dependence of tunnel magnetoresistance (TMR) ratio, resistance, and coercivity from 4.2 K to room temperature and applied voltage dependen ce of the TMR ratio and resistance at room temperature for a tunnel junctio n, Ta (5 nm)/Ni79Fe21 (3 nm)/Cu (20 nm)/Ni79Fe21 (3 nm)/Ir22Mn78 (10 nm)/Co 75Fe25 (4 nm)/Al (0.8 nm)-oxide/Co75Fe25 (4 nm)/Ni79Fe21 (20 nm)/Ta(5 nm), were investigated. TMR ratio, effective barrier height and width, and break down voltage of the junction can be remarkably enhanced after annealing at 300 degrees C for an hour. High TMR ratio of 49.7% at room temperature and 69.1% at 4.2 K were observed. The value of spin polarization of Co75Fe25, P = 50.7%, deduced from the TMR ratio at 4.2 K was corresponding well to the experimental data measured at 0.2 K in a spin polarized tunneling experime nt using a superconductor/insulator/ferromagnet tunneling junction. (C) 200 0 American Institute of Physics. [S0003-6951(00)05028-2].