Progress update on CVD of beryllium

Citation
Kv. Salazar et al., Progress update on CVD of beryllium, FUSION TECH, 38(1), 2000, pp. 69-73
Citations number
7
Categorie Soggetti
Nuclear Emgineering
Journal title
FUSION TECHNOLOGY
ISSN journal
07481896 → ACNP
Volume
38
Issue
1
Year of publication
2000
Pages
69 - 73
Database
ISI
SICI code
0748-1896(200007)38:1<69:PUOCOB>2.0.ZU;2-F
Abstract
Capsules with beryllium ablators are very important targets for the DOE Nat ional Ignition Facility (NIF) laser in the Inertial Confinement Fusion Prog ram. Two leading candidates for fabricating beryllium capsules are the mach ining and bonding of hemispheres, and physical vapor deposition of berylliu m onto plastic or other shells. An attractive possibility would be to coat a spherical mandrel with a thin layer of beryllium by a non-line-of-sight p rocess. This coating could be applied via the chemical vapor deposition (CV D) of beryllium. Our first attempt at coating beryllium via CVD was done by using bis(cyclop entadienyl)beryllium, (C2H5)(2)Be, as the precursor material. Results obtai ned by use of (C5H5)(2)Be as the precursor material is discussed. However, difficulties we encountered with use of the (C5H5)(2)Be precursor material led us to examine a relatively unexplored area of beryllium chemis try, namely that of its amines. This redirection also led us to change surr ogate material for use in the developmental work.