Effect of vacuum ultraviolet radiation on the gap fill properties of teflon amorphous fluoropolymer film deposited by direct liquid injection

In this brief, the roles of vacuum ultraviolet (VUV) photons in improving t he gap fill properties of a low dielectric constant (K) material (Teflon am orphous fluoropolymer, K = 1.93) deposited by direct liquid injection assis ted rapid photothermal chemical vapor deposition technique are discussed. A qualitative explanation is presented wherein it is proposed that high-ener gy photons provide photoexcitation of the species involved in the depositio n of Teflon AF(TM), thereby lowering the activation energy and migrational enthalpy required for surface diffusion leading to a higher molecular mobil ity on the patterned surface.