A novel lateral bipolar transistor with 67 GHz f(max) on thin-film SOI forRF analog applications

Citation
H. Nii et al., A novel lateral bipolar transistor with 67 GHz f(max) on thin-film SOI forRF analog applications, IEEE DEVICE, 47(7), 2000, pp. 1536-1541
Citations number
9
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
47
Issue
7
Year of publication
2000
Pages
1536 - 1541
Database
ISI
SICI code
0018-9383(200007)47:7<1536:ANLBTW>2.0.ZU;2-A
Abstract
In this paper, a novel lateral bipolar transistor on thin film silicon-on-i nsulator (SOI) is presented. With a small emitter size of 0.12 x 3.0 mu m(2 ),low base resistance of 270 Omega due to a novel Co silicided base electro de and low base-collector parasitic capacitances of 1.4 fF due to SOI mater ial achieve the highest f(max) of 67 GHz among the SOI bipolar transistors. Also, the low emitter-base capacitance of 1.5 fF and the low collector-sub strate capacitance of 2.5 fF are realized. The transistor has a simple stru cture, which is fabricated with simplified processes without any new sophis ticated technologies, ex. trench isolation and epitaxial base used in curre nt bipolar transistors. This can lower the fabrication cost of transistors. We have demonstrated the possibility of lateral bipolar transistor on thin film SOI as next-generation device for RF analog applications.