Effects of substrate offset angles on MBE growth of ZnO

Authors
Sakurai, K Kanehiro, M Nakahara, K Tanabe, T Fujita, S Fujita, S
Citation
K. Sakurai et al., Effects of substrate offset angles on MBE growth of ZnO, J CRYST GR, 214, 2000, pp. 92-94
Citations number
3
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
214
Year of publication
2000
Pages
92 - 94
Database
ISI
SICI code
0022-0248(200006)214:<92:EOSOAO>2.0.ZU;2-1
Abstract
Effects of sapphire substrate offset angle on MBE growth of ZnO films were investigated. Twin crystal RHEED patterns and surface facetting observed wi th c-plane just-oriented substrates were suppressed by enlarging the offset angles from near-zero to 2.87 degrees. Improvement in FWHM of XRC and surf ace morphology was observed with larger offset angles. indicating that the offset angle also is a sensitive factor for ZnO film growth. (C) 2000 Elsev ier Science B.V. All rights reserved.