Reduction of surface recombination in n-type HgZnTe (x=0.16) crystal

Citation
Kh. Kim et al., Reduction of surface recombination in n-type HgZnTe (x=0.16) crystal, J CRYST GR, 214, 2000, pp. 255-259
Citations number
9
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
214
Year of publication
2000
Pages
255 - 259
Database
ISI
SICI code
0022-0248(200006)214:<255:ROSRIN>2.0.ZU;2-A
Abstract
A model of surface recombination velocity for n-type Hg1-xZnxTe is presente d. It has been shown that, both experimentally and theoretically, the surfa ce recombination velocity is dominated by Shockley-Read recombination mecha nism at higher temperature and dominated by Auger process at low temperatur e. We have further developed a surface recombination theory for the narrow- gap semiconductor. It is concluded that the optimum conditions to reduce re combination velocity is about 2 x 10(11) cm(-2) in the fixed charge density and the Cd0.8Zn0.2Te passivation layer thickness is between 140 and 160nm. (C) 2000 Elsevier Science B.V. All rights reserved.