Luminescent properties of ZnO thin films grown epitaxially on Si substrate

Citation
A. Miyake et al., Luminescent properties of ZnO thin films grown epitaxially on Si substrate, J CRYST GR, 214, 2000, pp. 294-298
Citations number
5
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
214
Year of publication
2000
Pages
294 - 298
Database
ISI
SICI code
0022-0248(200006)214:<294:LPOZTF>2.0.ZU;2-W
Abstract
ZnO thin films were grown on Si(1 1 1)substrates by employing an epitaxial ZnS thin film as a buffer layer. The structural and luminescent properties of the ZnO thin films have been investigated in view of the application to opto-electronic devices due to near-ultraviolet emission by exciton the bin ding energy of which is about 60 meV. When the epitaxial ZnS buffer layer w as grown on the Sil(1 1 1) substrate at a substrate temperature of 200 degr ees C by electron beam evaporation, the epitaxial ZnO film was successfully grown on the ZnS/Si(1 1 1) layer with the orientation of (0 0 0 2), [1 1 ( 2) over bar 0]ZnO parallel to (1 1 1), [1 (1) over bar 0]Zns parallel to (1 1 1), [1 (1) over bar 0]Si(1 1 1) at a substrate temperature of 400 degree s C. An excitonic emission with a peak at 3.35 eV at 20 K was successfully obtained by exciting at 315 nm of He-Cd laser. (C) 2000 Published by Elsevi er Science B.V. All rights reserved.