Growth of mesoscopic correlated droplet patterns by high-vacuum sublimation

Citation
M. Brinkmann et al., Growth of mesoscopic correlated droplet patterns by high-vacuum sublimation, PHYS REV B, 61(24), 2000, pp. R16339-R16342
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
61
Issue
24
Year of publication
2000
Pages
R16339 - R16342
Database
ISI
SICI code
0163-1829(20000615)61:24<R16339:GOMCDP>2.0.ZU;2-2
Abstract
A novel growth mode, characterized by absence of grain coarsening, Ostwald ripening, and secondary nucleation, is observed for a polar conjugated mole cule, viz. tris-(8-hydroxyquinoline) aluminum (III) (Alq(3)), grown onto an apolar silicon substrate by high-vacuum sublimation. It results in correla ted droplet patterns on a mesoscopic length scale with narrow size distribu tion, which can be tuned by means of the deposition time t and substrate te mperature T-s. A comprehensive analysis of the results is obtained on the b asis of a capture zone model.