INVESTIGATION OF A STEP-DOPED-CHANNEL NEGATIVE-DIFFERENTIAL-RESISTANCE TRANSISTOR

Citation
Lw. Laih et al., INVESTIGATION OF A STEP-DOPED-CHANNEL NEGATIVE-DIFFERENTIAL-RESISTANCE TRANSISTOR, JPN J A P 1, 36(5A), 1997, pp. 2617-2620
Citations number
12
Categorie Soggetti
Physics, Applied
Volume
36
Issue
5A
Year of publication
1997
Pages
2617 - 2620
Database
ISI
SICI code
Abstract
An interesting AlGaAs/InGaAs/GaAs step-doped channel negative-differen tial-resistance transistor (SDCNDRT) has been fabricated. The SDCNDRT is based on a previously reported step-doped-channel field-effect tran sistor, (SDCFET). The N-shaped negative-differential resistance (NDR) are three-terminal-controlled NDR phenomena. We believe that the NDR p henomena can be attributed to the real space transfer (RST). A maximum drain current and peak-to-valley current ratio (PVCR) of 59 mA and 6. 6 are obtained, respectively. The high drain current and PVCR indicate the potential of the SDCFET for practical circuit applications.