Fault data for integrated circuits manufactured on silicon wafers are usual
ly presented using wafer maps to indicate the spatial distribution of defec
ts. This paper shows how this type of spatial data can be analyzed under th
e framework of generalized linear models. This provides a systematic method
for monitoring the quality of a manufacturing process, and identifying fau
lt sources with assignable causes that may possibly be eliminated with proc
ess improvement as a result. We consider models that account for different
spatial patterns and, in particular, the observed phenomenon that the fault
s are distributed non-uniformly across the wafer. Furthermore, we demonstra
te how designed experiments can be used in optimizing the setting of import
ant process parameters. Copyright (C) 2000 John Wiley & Sons, Ltd.