Multilayer CNx/TiN composite films prepared by multi-are assisted DC reactive magnetron sputtering

Wr incorporated the multi-are discharge in a reactive magnetron sputtering system to produce alternating CNx/TIN coatings. X-ray photoelectron spectro metry (XPS) measurements showed that the carbon nitride was formed and the N content was between 12 and 40 at.% in the CNx films. The microstructure o f the films was studied by atomic microscopy (AFM) and transmission electro n diffraction (TED). There were beta-C3N4 and c-C3N4 phases in the films. U nder appropriate deposition conditions, alternating CNx/TIN coatings with h igh hardness, low friction coefficient and good adhesion were obtained on h igh-speed tool steel (HSS) substrates. (C) 2000 Published by Elsevier Scien ce S.A. All rights reserved.