Titanium dioxide (TiO2) films prepared by a sol-gel method were irradiated
with 0.5 MeV V, Ti and 1.8 MeV Au ions and subsequently annealed at approxi
mately 480 degrees C. After the implantation and thermal annealing, the mic
rostructure and the optical properties of the TiO2 films were studied by Ru
therford backscattering spectrometry (RBS), optical absorption and glancing
angle X-ray diffraction measurements. It was found that the distribution o
f the implanted metal was slightly changed after annealing. The absorption
edge of the films also slightly shifted toward the longer wavelength side.
The films were composed of anatase and rutile phases. The anatase phase was
reduced by ion implantation. (C) 2000 Elsevier Science S.A. All rights res
erved.