A considerable diversity of electrical plasma is used to modify the of mate
rials which range from semi-conductors. In developing a particular process
it is essential to characterise the wide range of physical and chemical pro
cesses taking place, both in the body of the plasma and at the interface be
tween the plasma and the workpiece whose surface is to be modifies. Among t
he diagnostic tools available are mass spectrometer systems. To illustrate
the range of information which may be obtained, the present paper describes
the use of a quadrupole mass spectrometer in the study of a number of plas
ma application. For some of these the mass spectrometer instrument included
an energy filter which greatly increased the range of investigations which
could be undertaken. The measurement discussed include studies of both pos
itive and negative ions and of neutral species sampled from plasma.