Characterization of PECVD films of SiOxNy : H

Authors
Viard, J Durand, J Beche, E Berjoan, R Ducarroir, M Nadal, M
Citation
J. Viard et al., Characterization of PECVD films of SiOxNy : H, VIDE, 54(294), 1999, pp. 503-512
Citations number
10
Categorie Soggetti
Material Science & Engineering
Journal title
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
ISSN journal
12660167 → ACNP
Volume
54
Issue
294
Year of publication
1999
Pages
503 - 512
Database
ISI
SICI code
1266-0167(1999)54:294<503:COPFOS>2.0.ZU;2-T