Morphological analysis by atomic force microscope and light scattering study for random scattering screens

Citation
Dp. Qi et al., Morphological analysis by atomic force microscope and light scattering study for random scattering screens, ACT PHY C E, 49(7), 2000, pp. 1260-1266
Citations number
12
Categorie Soggetti
Physics
Journal title
ACTA PHYSICA SINICA
ISSN journal
10003290 → ACNP
Volume
49
Issue
7
Year of publication
2000
Pages
1260 - 1266
Database
ISI
SICI code
1000-3290(200007)49:7<1260:MABAFM>2.0.ZU;2-2
Abstract
The morphology of random screens with different surface roughness is studie d with atomic force microscope and it is found that their height distributi ons have very obvious fractal characteristics in short range regions. For s creens with larger and smaller roughness,the fractals exist in the forms of random height fluctuations and small grains without characteristic size re spectively. The self-affine fractal surface model is introduced to the quan titative descriptions of random screens. The light scattering measurements show that: (I)the scattered intensity in off-axis region descends in negati ve power functions,and the theoretical analysis based on self-affine fracta l model indicates that it originates from the short-range fractal of the sc reens;and (2) there is a halo ring in the scattered fields in the paraxial region. This phenomenon cannot yet be explained on the basis of the self-af fine fractal model.