Minority carrier diffusion, defects, and localization in InGaAsN, with 2% nitrogen

Citation
Sr. Kurtz et al., Minority carrier diffusion, defects, and localization in InGaAsN, with 2% nitrogen, APPL PHYS L, 77(3), 2000, pp. 400-402
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
3
Year of publication
2000
Pages
400 - 402
Database
ISI
SICI code
0003-6951(20000717)77:3<400:MCDDAL>2.0.ZU;2-9
Abstract
Electron and hole transport in compensated InGaAsN (approximate to 2% N) ar e examined through Hall mobility, photoconductivity, and solar cell photore sponse measurements. Short minority carrier diffusion lengths, photoconduct ive-response spectra, and doping dependent, thermally activated Hall mobili ties reveal a broad distribution of localized states. At this stage of deve lopment, lateral carrier transport appears to be limited by large scale (mu ch greater than mean free path) material inhomogeneities, not a random allo y-induced mobility edge. (C) 2000 American Institute of Physics. [S0003-695 1(00)04629-5].