Cm. Feng et al., CRITICAL-BEHAVIOR OF A METALLIC DIFFUSE-FRINGE FILM PERCOLATION SYSTEM, Science in China. Series A, Mathematics, Physics, Astronomy & Technological Sciences, 40(7), 1997, pp. 767-772
Preparation of a metallic diffuse-fringe film system and its electrica
l properties are reported. The anomalous R-I characteristics, third-ha
rmonic coefficient and critical behavior are observed in the film syst
em. Analysis shows that this behavior is caused by the location-depend
ent tunneling and hopping effects, which result from the continuous va
riation of the diffuse fringe structure of the film due to the increas
e of the current.