M. Starodubtsev et al., Oblique electron-beam injection into plasma: Effect of external magnetic field upon gun environment, IEEE PLAS S, 28(2), 2000, pp. 367-370
When injecting an electron beam,vith a significant pitch-angle In a magneto
plasma, one has to take care that the par allel velocity of the electrons m
easured in the plasma does not only depend on the acceleration potential be
tween the anode and the cathode of the electron gun, hut also on the amplit
ude of the ambient magnetic field. The latter can play an important role wh
en the actual acceleration distance of electrons in the gun vicinity, deter
mined partly by collective processes that lead to potential modification in
the gun environment, is large enough. Consequently, the actual beam pitch-
angle can be noticeably different from the orientation of the electron gun.