A systems approach to photolithography process optimization in an electronics manufacturing environment

There are many complex problems in the optimization of an electronics manuf acturing environment, and it is the view of the authors that these problems should not be solved and optimized in isolation, but analysed in the frame work of a system. A systems approach offers an overall approach for solving problems, and optimizing the whole of the system as well as discrete subsy stems. The research introduced in this paper integrates several techniques, namely: Integrated computer aided manufacturing DEFinition (IDEF), and exp erimental design and response surface methods for the analysis, control and optimization of electronic manufacturing processes. Electronics manufactur ing includes three major processes; Printed Circuit Board (PCB) manufacturi ng, semiconductor device manufacturing and electronics assembly. This paper describes a novel generic systematic methodology that has been used to cre ate a model to optimize the photolithography process in PCB manufacture. Fo r this, photolithography has been considered as a whole system made up of s everal sub-systems. This is shown in the process map for PCBs that focuses on photolithography and its subprocesses. A model of the manufacturing proc ess is then given with the results of this being validated using an industr ial study. Optimized settings for processing equipment are given resulting in an increase in process yield within industry.